Item #783: Silicon 100mm P/B(100) 1-10 ohm-cm 500um SSP PRIME GRADE
"The wafers are used as substrates for SU-8 masks for microfluidics and microcontact stamping tools for bioengineering."
"We build microfluidic devices using PDMS, which we fabricate using a soft lithography technique on silicon wafer molds patterned with positive or negative resists. Our features are 25-50 microns tall and 10-150 microns wide. We've found very good adhesion of both SU-8 2025 and AZ-40XT-11d resists on your wafers."
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SU-8 is often used as a negative photoresist based on epoxy and is cross-bound. A negative refers to the Ultra-Violet (UV) exposed part, while the rest of the film remains soluble and can be washed away during development.
These epochs are interconnected and are interconnected to give the final structure. Statistical averages of the film are the difference between the total number of images in the film and a single image in the film.
It can be processed by spinning and spreading viscous polymers and curing on poor substrates. This absorption leads to increased sidewall undercuts (up to 500%) and a reduction in surface area due to increased film thickness.
It can be used to model structures with a high aspect ratio and at high temperatures, such as those prevailing in environments with high - temperature and low - humidity.
The SU-8 is designed for the photo varnishing and microelectronics industry to provide a high quality, cost effective and flexible photo reactor for the production of microfluidics. It can also be used in a wide range of applications, such as photovoltaics, photonics, semiconductors, nanosciences, and even biofuels and biotechnology.
A researcher asks:
We would like to buy 1 pc of SU-8 2050-500ml Glass Photoresist, 1 pc of SU-8 2005 500ml Glass photoresist, 1 pc of SU-8 Developer 4L Poly for our research center.
UniversityWafer, Inc. Replied:
Our SU-8 product is called HARE-SQ. The technical data sheet is attached. Pricing is listed below. Lead time is 1-2 weeks.
HARE SQ 5 (similar to 2005): $/pint
HARE SQ 50 (similar to 2050): $/pint
HARE Developer (PGMEA): $/gallon
Please contact us for pricing.
SU-8 Photoresist is a soluble negative chemical amplification photoresist that is manufactured for use in photo varnishing and microelectronics. The versatile product is used in a variety of industries including semiconductors, nanosciences, and biofuels. SU-8 is the most popular negative photoresist. It is widely used in a wide range of applications and is widely available for purchase.
SU-8 photoresist is an epoxy-based negative photoresist. It has parts that crosslink when exposed to ultraviolet light and the remaining is soluble. The remaining portion can be washed away during the development process. The name SU-8 comes from the presence of eight epoxy groups per moiety, which is the statistical average. The epoxies crosslink to create the final structure.
SU-8 photoresist is typically used for low-volume printing and small-scale manufacturing processes. It is a versatile material that has multiple applications. It can be used for both negative and positive microelectronics. Many SU-8 fabrication companies and reputed manufacturers offer a wide range of SU-8 materials. For more information, visit a website. There is also an e-commerce website where you can order SU-8 for a small fee.
SU-8 is an epoxy-based photoresist that is primarily used for microelectronic and micromachining applications. The material is known for its thermal and chemical stability. It also has a high optical transparency. SU-8 is most appropriate for imaging near vertical sidewalls of thick films. If you want a more permanent solution, you should consider SU-8. The following are some of its benefits and characteristics.
SU-8 Photoresist is an epoxy-based negative photoresist that combines a solid photoresist with an epoxide-based negative photoresist. Its name comes from its eight epoxy groups per moiety. As mentioned, SU-8 is a negative photoresist that is a common material used in photographic equipment. During the processing of film, a film made from this epoxide-based resist will yield images with high contrast.
SU-8 Photoresist has a tendency to form a "bugle" around a wafer. This occurs when the SU-8 photoresist is used for the first time, after it has been exposed to a light. This bugle is caused by the surface tension of the photoresist. The photomask is first in contact with the bugle during exposure, which results in a loss of resolution. The size of the bugle depends on the viscosity and type of SU-8. A 100um SU-8 will result in a bugle of several micrometers in diameter.
SU-8 is a negative epoxy-based photoresist. It contains eight epoxy groups in a single molecule. It is a cross-linked polymer that has excellent resistance to light. It can be used in a wide range of industrial processes, including etching and printing. It is widely available and suitable for a wide variety of industries. If you are wondering what SU-8 is, you'll want to know as much as you can about it.
SU-8 is an epoxy-based negative photoresist. It contains portions that are cross-linked and the remainder is soluble, meaning that the photoresist is washed away during development. Its name comes from its cationic and acid nature. Since these materials are sensitive to humidity, they should be stored in a dark box in order to prevent them from becoming sticky or brittle. This will allow them to dry, but the final cross-linkage time will vary from one batch to another.
SU-8 Photoresist is an epoxy negative-based photoresist that can be used for the fabrication of thick structures. It is a highly polymeric resin that is soluble in organic solvents and is used for a wide range of applications. As an added benefit, SU-8 can be easily cut and pasted onto metal surfaces. This is especially useful in making thin-films.
SU-8 is a negative epoxy-based photoresist that is cross-linked with ultraviolet rays. The SU-8 photoresist contains 8 epoxy groups and is very sensitive to UV light. It is used for microfluidics and soft lithography and is recognized as a biocompatible material. Its good adhesion properties make it an ideal choice for sensitive imaging.
We have a large selection of wafers for SU-8 photoresist for photolithography. Below is just some silicon wafer's specs purchased researchers.
Buy Online! Si Item #447 - 76.2mm P/B <100> 0-100 ohm-cm 406-480um SSP Test Grade
"Our research clients focuses on cellular and molecular properties of axonal outgrowth and transport that are disrupted in neurodegenerative diseases."
" I am using the wafers to create microfluidic device molds by SU-8 photolithography."
Item #452: Silicon 100mm P/B(100) 0-100 ohm-cm 500um SSP TEST GRADE
The above item #452 is also used by researchers to "create biological molds using SU-8 photoresist. These molds in turns are then cast into a plastic called PDMS and used to study cell behavior and its interactions for the purpose of create a cancer diagnostic.
Client asks:
"Would (452) those wafers work for spin coating SU-8 photoresist on them? These wafers will be used for fabricate microfluidic chips."
Answer YES!
PDMS is polydimethulsiloxane. I need to coat SU-8 on the wafers first, then put PDMS on it. I just need a smooth surface so that I can peel the PDMS off later.
Researchers use the following wafers for mold making.
"I would like to order 100mm silicon wafer for SU8 lithography on one side, so I believe it has to be polished on one side. Could I ask you which silicon wafer you will choose for that? You have many different types and Im not sure which one is the best for me."
"My student is using the wafers for microfluidic masters (aka molds). He is spinning SU-8 photoresist onto the wafers and patterning the photoresist to make these masters."
In some cases researchers perfer a rough surface to a smooth surface. Mechanical grade wafers are often used.
" There is nothing wrong with the wafers, but it is not suitable for our application. We are working with the photoresist, such as SU-8 and AZ-9620. The 1196 is working well, but the surface of 452 is too smooth for the photoresist to stick, even after being treated with HMDS."
Item #1080: Silicon 76.2mm any type, dopant, orientation, 380um SSP mechanical grade
The intended use is for photolithography purposes using SU-8 negative photoresist for your reference.
Item #695: Silicon 76.2mm N/Ph <100> 1-10 ohm-cm 380um SSP Prime
Researcher: "We're using them in photolithography and going to put down SU8, do you have a suggestion? I've used Corning Eagle glass before, but you don't have any 6"
Client questions:
"I would like to buy SU8 and also silicon wafer for our lab. We need to fabricate a mold for PDMS fabrication. We need high thickness (around 500 micron). Firstly, I would like to consult with you about which type of SU8 products is suitable for our work? and also I need the most economical price for them. Thanks."
"Hi, We would like to purchase wafers for using microfluidic applications (with SU-8 photoresist and PDMS). I think silicon test wafer is appropriate for us, I think ID is 857. Could you please send a proforma for 10 wafers? "