UniversityWafer, Inc. provided the silicon wafers with an SiO2 layer for the following research:
Researcher:
I would like to get for: Deposit Thermal Oxide on a 76mm silicon wafer with 2850 Angstroms Oxide layer. Package of 25 Quantity.
Actually, I need your recommendation on selecting the right wafer. I am currently growing MoS2 with the CVD method. Later I transfer them to other surfaces for my experiments. So, which wafer should I use to grow MoS2 on them?
Please reference #262285 for specs/pricing.
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Transistors made from Molybdenum Disulfide (MoS2) films have shown a good on/off current ratio and a high carrier mobility [7-10,16-19], making them highly suitable for the next-generation transistor devices. Recently, much efforts have been directed towards studying molybdenum disulfide (MoS2), especially the MoS2 monolayer semiconductor thin films, because of their great electrical and optical properties. For example, the 2D-MoS 2 bandgap, which changes from a direct one (in the bulk form) to an indirect one for ultrathin films (smaller layers), offers novel prospects for different applications in optics.
In the current study, NaCl-assisted growth is used to produce high-quality monolayered films on Silicon on SiO2 and multilayered films of MoS2 on fluorine-doped tin oxide. An empirical methodology was used to determine optimal conditions for sample growth. Factors such as precursor weights and ratios, temperature, and sulfurization were investigated with respect to preparing samples for exploitable applications.
Can you please provide a list of semiconductor (either wafers or thin films) materials that you provide? Also, are you able to respond to specific requests; if so, what are the limitations?
Researcher:
"I am looking for solar cell grade thin films or wafers of (1-2 microns) of CdS, CdSe, MoS2, MoSe2, WS2, and WSe2 deposited on substrates. Any of the above would be great. Please let me know if this would be possible and please provide a quotation. Thanks"
Please reference #115426 for specs/pricing.
My lab uses silicon wafers as substrates for graphene/MoS2 exfoliation, and I am looking for
silicon wafers for this use with the following parameters:
Diameter: 100 mm
Type/Dopant: P/Boron
Orientation: <100>
Thickness: about 500 um
Resistivity: <1-10 ohm cm
Thermal Oxide: 270 nm
Could I receive two separate quotes on pricing for 25 wafers at Prime and Test grade? Also, could you inform me on what the differences are between Prime and Test grade?
Reference #170865 for specs/pricing.
We would like to order 10 pcs of 4 inch sapphire wafers, C-plane, about 500 um thick. We have indeed received the materials, everything was as ordered. Sapphire wafers we have ordered are used as substrates for CVD growth of MoS2 films.
Please reference #196583 for pricing.
A researcher requested a qutoe for the following:
Can you let me know if your SiO2 wafer with 300 nm Thermal oxide coating looks purple color (right pic). I particularly need this color becoz, we work a lot with 2D materials like graphene, MOS2 etc. When the Si wafer is of bluish-purple color, we get very good optical contrast when 2D materials are deposited on top. So can you let me know what is the tolerance of oxide layer thickness (what +/- %)
We only need to have thermal oxide coating such that the wafer looks purple in color (not greenish or any other). Our experience says that when oxide layer is 300nm thick, wafer looks purpleish and that gives good optical contrast. I just wanted to make sure because sometimes the same 300 nm wafers would look greenish in color when we purchased in different batches.
Reference #211788 for specs/pricing.
Researcher:
"We want to purchase some wafers for 2D materials exfoliation. I think everything is the same but with 300nm thermal oxidation layer. Could you please let me know the price?"
UniversityWafer, Inc. Reply:
Most electronic materials are mono-crystalline, forming a regular 3D lattice of atoms or molecules.
Recently, some materials with electronic properties, were discovered that are essentially mono-atomic layers,
of crystalline materials, specifically graphene, or MoS2. I think that these are referred to as 2D electronic materials.
Reference #235534 for specs/pricing.
PLDs also offer an advantage in growing 2D-TMDS in crystallized state at room temperature, paving the way to deposit MoS 2 films on flexible, heat-sensitive substrates, thus leading to various novel applications. PLD also offers an additional opportunity of tuning, nearly almost quasi-independently, various parameters for MoS 2 films deposition, and thus tuning their desired properties on demand. The introduction of molten salts lowers the melting temperature of metal precursors, forms intermediate products like metal oxychlorides, increases the flux of mass, and increases growth rates, which makes it possible to generate a single crystal as small as millimeters, and films that are as large as centimeters. The low cost and high efficiencies of salt-assisted growth has encouraged researchers to develop different methods for growing two-dimensional materials for use in generating monolayer films on wafer-scale, uniform, and pure films. However, a high-efficiency of the growth, which can facilitates generating monolayer films up to millimeters. The high-efficiency has encouraged researchers to develop different methods of growth on a millimeter-sized and film-size films. The low-cost and high-efficiency. The high-efficiency of salt-assisted growth has encouraged researchers to design different methods of 2-D materials for growth, to be used for generating monolayer films at the scale and uniformly pure films. However, aand a scalable.